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Semiconductor Equipment

  • Listed: February 18, 2020 10:06 pm
  • Expires: 9894 days, 18 hours

Description

Semiconductor Equipment. In China.SUBJECT TO PRIOR SALE WITHOUT NOTICE.PLEASE CONTACT US IF YOU ARE INTERESTED IN IT. WE APPRECIATE YOUR TIME.
1 Stepper NSR-2005i8A Japan Nikon
2 Stepper NSR-2005i8A Japan Nikon
3 Stepper NSR-4425i Japan Nikon
4 Mask Aligner MA6 德国 SUSS
5 Mask Aligner MA6 德国 SUSS
6 Mask Aligner MA150 CC 德国 SUSS
7 Track Mark Vz Japan TEL
8 Track Mark V Japan TEL
9 Track Mark V Japan TEL
10 Track DNS 80B Japan DNS
11 Furnace SVG5200 USA SVG
12 Furnace SVG5200 USA SVG
13 Furnace SVG5200 USA SVG
14 Furnace SVG5200 USA SVG
15 Vertical Furnace DD-802V-H Japan KOKUSAI
16 Vertical Furnace DD-802V-H Japan KOKUSAI
17 Vertical Furnace DD-802V-H Japan KOKUSAI
18 Vertical Furnace DD-802V-H Japan KOKUSAI
19 Vertical Furnace DD-802V-H Japan KOKUSAI
20 Vertical LP-CVD DJ-802V-H Japan KOKUSAI
21 Vertical Furnace DJ-803V-H Japan KOKUSAI
22 Vertical Furnace DJ-803V-H Japan KOKUSAI
23 Vertical Furnace DD-803V-H Japan KOKUSAI
24 Vertical Furnace DD-803V-H Japan KOKUSAI
25 Vertical Furnace DD-803V-H Japan KOKUSAI
26 RTP AG8108 USA AG Associate
27 Trench Etch LAM 9400 TRENCH USA LAM
28 UV Bake M150PC USA Fusion
29 UV Bake M150PC USA Fusion
30 PR Stripper UV3150 Japan Chemscan
31 PR Stripper UV3150 Japan Chemscan
32 HF FUME EXCALIBUR2000 USA Semitool
33 Sputter 3290STQ USA Varian
34 Sputter 3290STQ USA Varian
35 PECVD CONCEPT ONE-150 USA Novellus
36 PE-TEOS CONCEPT ONE-150 USA Novellus
37 SOG TR6133UD USA SEMIX
38 PECVD P5000 USA AMAT
39 CMP EPO-222 Japan EBARA
40 CMP IPEC472 USA Novellus
41 Cleaner Ontrack USA LAM
42 Grinder DFG840 Japan DISCO
43 Grinder DFG841 Japan DISCO
44 Profile P10 USA KLA Tencor
45 Profile P11 USA KLA Tencor
46 Profile P11 USA KLA Tencor
47 Profile P11 USA KLA Tencor
48 Wafer Thickness ADE 9500 USA ADE
49 Film Thickness NANO 215S USA Nanometrics
50 Four Point RS55 USA KLA Tencor
51 Particle WM3 Japan TOPCON
52 Particle Tencor 6100 USA KLA Tencor
53 Particle SFS 7600 USA KLA Tencor
54 Particle SFS 7600M USA KLA Tencor
55 AOI(IR) MX1000 USA Phoseon Tech
56 AOI(IR) MX1001 USA Phoseon Tech
57 AOI(IR) MX1002 USA Phoseon Tech
58 Auto Microscope NWL641 Japan Nikon
59 Roughness Tester Roughness Japan KOSAKA
60 Reflection X-Ray Fluorescence Spectrometer Trex 610 USA Technos
61 Reflection X-Ray Fluorescence Spectrometer Trex 610 USA Technos
62 Luminescence Defect Inspection System Inpectra PL Japan
63 SEM XL40 FEI
64 Oxide Etch Tegal 903 USA Tegal
65 Oxide Etch Tegal 903e USA Tegal
66 Oxide Etch TYLAN TAKUDA Japan TAKUDA
67 Oxide Etch TYLAN TAKUDA Japan TAKUDA
68 Oxide Etch Matrix 303 USA Matrix
69 Oxide Etch Matrix 403 USA Matrix
70 Oxide Etch Matrix 403 USA Matrix
71 Oxide Etch AMAT8116 USA AMAT
72 Oxide Etch AMAT8116 USA AMAT
73 Oxide Etch AMAT8336 USA AMAT

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