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Semiconductor Equipment

  • Listed: February 19, 2020 10:21 am
  • Expires: 9781 days, 6 hours

Description

Semiconductor Equipment. SUBJECT TO PRIOR SALE WITHOUT NOTICE.PLEASE CONTACT US IF YOU ARE INTERESTED IN IT. WE APPRECIATE YOUR TIME.
1 MOCVD AIX2400 G3/HT(R) 14400KVA AIXTRON 2004
2 MOCVD 19×2GAN G2 72200KVA AIXTRON 2004
3 Plasma etching machine MULTIPLEX 8.32KVA STS 2001
4 PECVD ND200 11KVA UNAXIS / NEXTRAL 2001
5 SEM JSM5610 3KVA JEOL 2002
6 Mask Aligner Q4000 0.22KVA QUINTEL 2001
7 Ellipsometry GESP-5 230V 50HZ SOPRA 2001
8 Spin rinse dryer (SRD) 1800-6 Wafer Size: 6″ VERTEQ 2001
9 Vacuum evaporator SEC 600 RAP 120-208V, 60Hz, 60A, 3-phase, 5-wire, 6.25GPM, 90-110PSI CHA 2001
10 Automatic wire bonders (parts system) CBT 6000 Parts system HUGHES / PALOMAR 2001
11 Plasma etching machine PLASMALAB UETCH 300 Wafer Size:12″ OXFORD 2012
12 Microscope MX50L-TF Stage size:200*300mm OLYMPUS 2007
13 Flatness Instrument for Glass Substrate 128892-BLIMP measuring range:1220×1400mm CORNING TROPEL 2005
14 candela 7100 120V 10A 1Ph KLA-Tencor 2012
15 AFM D3100 1KVA VEECO 2007
16 Optical Profilers WYKO NT3300 1KVA VEECO 2003
17 Optical Profilers View5000 1KVA Zygo 2005
18 ICP 100+ICP180 Unique process gases: octafluorocyclobutane (C4F8), trifluormethane (CHF3), and Sulfur Exafluoride (SF6). OXFORD 2005
19 PECVD Plasmalab 80+PECVD Process gasses : SiH4, NH3, N2O, N2, CF4 OXFORD 2005
20 Optical Profilers WYKO NT3300 VEECO 2004–2007
21 ION MILLING (Diamond-Like Carbon) DLC350 VEECO 2000
22 Parts P/N:3440D-12-8004_SA KLA-Tencor 2019
23 Wafer handling manipulator P/N:162386 Brooks 2018
24 Profilers DEKTAK8 VEECO
25 Gas chromatography time of flight mass spectrometer JMS-T100GC JEOL
26 Hall effect HL5570 Only hosts BIORAD 2001
27 TEMLINK 14471-001 FEI 2015

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Listing ID: 6535e4d7c3480482

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